Wafer Exposure System (Mask Aligner) For R&D

Manual Type for Research and Development

 

[Overview]
match for various application such as R & D and small-lot production.
support 3 kinds of Gap control such as “Hard contact”, “Soft Contact”, and “Proximity Gap”.
[Use]
Glass, Wafer, Film or Ceramic etc.
R & D or Small lot production
[Specification]
Work size : 12inch, 6-8inch, 4-6inch, 2-4inch, Square shape
Work Load/unload : Manual
Alignment Method : Manual Alignment or Automatic Alignment (Selectable)
Gap Control : Automatic or Manual (Selectable)